Direct phase-shift measurement with transmitted deep-UV illumination

Haruhiko Kusunose; Naoki Awamura; Hideo Takizawa; Kouji Miyazaki; Takahiro Ode; Daikichi Awamura

doi:10.1117/12.245242

24 July 1996 Direct phase-shift measurement with transmitted deep-UV illumination

Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245242
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

This paper describes a direct phase-shift measurement system with transmitted deep-UV illumination for phase shifting mask (PSM) using a lateral shearing interferometer system. This interferometer has new structure developed for this purpose. The mirror mount of the interferometer is made of SiC ceramics that promote stability against vibration and ambient temperature drift. The illumination employs a xenon mercury arc lamp that has a spectrum close to the wavelength of KrF excimer laser. The repeatability of measurements is 0.5 degree in 3 sigma. The system can measure a small pattern down to 1 μm with an alternating type PSM with the objective of N.A.=0.4. Influence of incident angle of illumination on phase-shift measurement is investigated by experiment. The results show similar effects with simulation for circular illumination. The phase-shift measurement results on quartz step meet well with a calculation from step height and known refractive index including the effect of incident angle of illumination. The deep-UV measurement results also have good correlation with calculations from the results with another direct phase-shift measurement system that wavelength is 365nm. The simulation for focus latitude of alternating type PSMs agree with the experimental results of wafer exposure and the phase measurement. The accuracy of this system is sufficient for application to development of phase shift mask process.

Citation Download Citation

Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, and Daikichi Awamura "Direct phase-shift measurement with transmitted deep-UV illumination", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245242

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available