Paper
31 December 2019 Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography
Author Affiliations +
Abstract
We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produce plasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented and we show the generated colors are dependent on their geometry and the direction of polarisation of incident illumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm2) plasmonic color with extended color gamut.
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M. Faris Shanin Shahidan, Jingchao Song, Timothy D. James, Paul Mulvaney, and Ann Roberts "Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography", Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011J (31 December 2019); https://doi.org/10.1117/12.2539079
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KEYWORDS
Nanoimprint lithography

Plasmonics

Electron beam lithography

Nanorods

Nanoantennas

Nanostructures

Printing

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