Presentation + Paper
21 August 2020 Optimization of saw-tooth surface planarization for ultra-low blaze angle gratings for ALS-U
Author Affiliations +
Abstract
Planarization is important in many areas of nanostructure fabrication. Here we describe a new process for planarization saw-tooth surface of blazed gratings used for the monochromatization of light, but the applications should be much wider. Such gratings consist of relatively wide and very shallow triangular grooves with slanted facets which are machined with nanometer accuracy. The process of making such gratings includes planarization of a relatively coarse saw-tooth surface with micron deep grooves following by a plasma etch which provides reduction of the facet angle and hence groove depth by a factor of 10 - 100. To achieve high quality of the final grating the planarization step should provide a flat surface over the grating facets with sub-nanometer level planarity. We investigated planarization of coarse saw-tooth surfaces with a groove width of 10 μm and a facet angle of 4° by a polymer coating spun on the grating. The optimized planarization procedure provides 100% planarization even on these highly structured surfaces.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sooyeon Park, Dmitriy L. Voronov, and Howard A. Padmore "Optimization of saw-tooth surface planarization for ultra-low blaze angle gratings for ALS-U", Proc. SPIE 11491, Advances in X-Ray/EUV Optics and Components XV, 1149108 (21 August 2020); https://doi.org/10.1117/12.2568712
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Cited by 1 scholarly publication.
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KEYWORDS
Ultraviolet radiation

Diffraction gratings

Plasma etching

Etching

Capillaries

Liquids

Silicon

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