Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma

Dmitry Shefer; Andrey Nikipelov; Mark van de Kerkhof; Vadim Banine; Job Beckers

doi:10.1117/12.2581666

22 February 2021 Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma

Dmitry Shefer, Andrey Nikipelov, Mark van de Kerkhof, Vadim Banine, Job Beckers

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116091F (2021) https://doi.org/10.1117/12.2581666
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

Extreme ultraviolet (EUV) lithography is a technology for high volume manufacturing (HVM) of integrated circuits. HVM defines critical specification for cleanliness of reticles (masks) used to impose a pattern on wafers. EUV-induced hydrogen plasma produced by photoionization of the H₂gas by the 13.5 nm photons plays an important role in the release and transport of particles from contaminated surfaces to the reticle. It was observed that the rate of particle deposition on the reticle in an EUV scanner scales with EUV power which in turn defines the properties of the EUV-induced plasma to increase the knowledge regarding this phenomenon. We demonstrate images, acquired by a scanning electron microscopy (SEM) to illustrate morphological changes, accumulating in particles of tin, lead and lead oxide that were subject to applied hydrogen plasma (non-EUV). These changes led to the potential loss of adhesion of these materials to the relevant surfaces or potential defectivity outbreaks via explosive fragmentation. This work proposes that the mechanical stress in particles' material lattice caused by accumulation of hydrogen bubbles under the surface plays the major role in the morphological changes observed.

Conference Presentation

Citation Download Citation

Dmitry Shefer, Andrey Nikipelov, Mark van de Kerkhof, Vadim Banine, and Job Beckers "Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116091F (22 February 2021); https://doi.org/10.1117/12.2581666

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available