The current status of nano-imprint lithography and its future outlook toward carbon neutrality by 2050

T. Nakasugi

doi:10.1117/12.2640653

15 September 2022 The current status of nano-imprint lithography and its future outlook toward carbon neutrality by 2050

T. Nakasugi

Author Affiliations +

Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1232503 (2022) https://doi.org/10.1117/12.2640653
Event: Photomask Japan 2022, 2022, Online Only

Abstract

Nano-imprint lithography (NIL) has unique features, including the ability to design at a resolution of 1x nm and three dimensional patterning. Although productivity was a concern for NIL, improvement has been made with recent technologies such as multi-field imprint and spin-coating resist. However, the environment surrounding the semiconductor industry is changing. One of the biggest waves is “carbon neutrality,” and it is believed that energy-saving technologies will be important for the future of the semiconductor industry. In this study, we evaluate the current performance of NIL and its future prospects as an energy-saving technology that will help the world achieve carbon neutrality by 2050.

Citation Download Citation

T. Nakasugi "The current status of nano-imprint lithography and its future outlook toward carbon neutrality by 2050", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232503 (15 September 2022); https://doi.org/10.1117/12.2640653

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