Paper
2 July 1998 Photoluminescence decay in porous silicon films
I. Baltog, M. L. Ciurea, Gabriela Pavelescu, L. Mihut, M. Baibarac
Author Affiliations +
Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312818
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania
Abstract
The photoluminescence (PL) decay measurements were performed on porous silicon films. It was observed that the two components of PL, one of them fast (ns) and the other slow (microsecond(s) or ms sometimes) have different contributions to PL signal, depending on the wavelength of the excitation light. The slow component of PL was in details investigated. Time decay cures for different excitation (337.1 nm, 470 nm, and 550 nm) and emission (550, 650, 700, 800 and 860 nm) wavelengths and also for different excitation intensities were taken. All decay curves were fitted with a stretched exponential. The slow component of PL was proposed to be attributed to the radiative recombination on surfaces.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. Baltog, M. L. Ciurea, Gabriela Pavelescu, L. Mihut, and M. Baibarac "Photoluminescence decay in porous silicon films", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); https://doi.org/10.1117/12.312818
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KEYWORDS
Luminescence

Picosecond phenomena

Silicon films

Silicon

Visible radiation

Etching

Nitrogen

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