Automated layout and phase assignment techniques for dark-field alternating PSM

Andrew B. Kahng; Huijuan Wang; Alexander Zelikovsky

doi:10.1117/12.332830

18 December 1998 Automated layout and phase assignment techniques for dark-field alternating PSM

Andrew B. Kahng, Huijuan Wang, Alexander Zelikovsky

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332830
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

We describe new, efficient algorithms for layout modification and phase assignment for dark field alternating-type phase- shifting masks in the single-exposure regime. We make the following contributions. First, we give optimal and fast algorithms to minimize the number of phase conflicts that must be removed to ensure 2-colorability of the conflict graph. These methods can potentially reduce runtime and/or improve solution quality, compared to previous approaches of Moniwa et al. and Ooi et al. Second, we suggest a new iterative 2- coloring and compaction approach that simultaneously optimizes layout and phase assignment. The approach iteratively performs the following steps: (1) compact the layout and find the conflict graph; (2) find the minimum set of edges whose deletion makes the conflict graph bipartite; and (3) add a new compaction constraint for each edge in this minimum set, such that the corresponding pair of features will no longer conflict. Third, we describe additional approaches to co- optimization of layout and phase assignment for alternating PSM. Preliminary computational experience appears promising.

Citation Download Citation

Andrew B. Kahng, Huijuan Wang, and Alexander Zelikovsky "Automated layout and phase assignment techniques for dark-field alternating PSM", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332830

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