Micro-optical structures for atom lithography studies

Erol C. Harvey; Tracy R. Mackin; Brian C. Dempster; Robert E. Scholten

doi:10.1117/12.364493

1 October 1999 Micro-optical structures for atom lithography studies

Erol C. Harvey, Tracy R. Mackin, Brian C. Dempster, Robert E. Scholten

Proceedings Volume 3892, Device and Process Technologies for MEMS and Microelectronics; (1999) https://doi.org/10.1117/12.364493
Event: Asia Pacific Symposium on Microelectronics and MEMS, 1999, Gold Coast, Australia

Abstract

Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to an atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements to manipulate the laser beam.

Citation Download Citation

Erol C. Harvey, Tracy R. Mackin, Brian C. Dempster, and Robert E. Scholten "Micro-optical structures for atom lithography studies", Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); https://doi.org/10.1117/12.364493

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