Sine wave artifact as a means of calibrating structured light systems

Kevin G. Harding

doi:10.1117/12.370261

16 November 1999 Sine wave artifact as a means of calibrating structured light systems

Kevin G. Harding

Proceedings Volume 3835, Three-Dimensional Imaging, Optical Metrology, and Inspection V; (1999) https://doi.org/10.1117/12.370261
Event: Photonics East '99, 1999, Boston, MA, United States

Abstract

Structured light systems made to provide dense data over full image fields present a unique challenge to the task of calibration. Localized artifacts made for CMM or hard gages are often a poor fit for testing actual 3D performance. This paper considers the use of a sine wave artifact to provide a mapping of a calibration matched to full-field capabilities. The sine wave offers the advantages of a continuous function across the full field, with a well defined and easy to analyze shape. Changes in scale in all dimensions, as well as localized variations can be mapped in clear detail using this method.

Citation Download Citation

Kevin G. Harding "Sine wave artifact as a means of calibrating structured light systems", Proc. SPIE 3835, Three-Dimensional Imaging, Optical Metrology, and Inspection V, (16 November 1999); https://doi.org/10.1117/12.370261

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