Trends in optical design of projection lenses for UV and EUV lithography

Wilhelm Ulrich; Susanne Beiersdoerfer; Hans-Juergen Mann

doi:10.1117/12.406667

8 November 2000 Trends in optical design of projection lenses for UV and EUV lithography

Wilhelm Ulrich, Susanne Beiersdoerfer, Hans-Juergen Mann

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406667
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

The continuing trend towards higher integration density of microelectronic circuits requires steadily decreasing feature sizes. The SIA roadmap defines the technologies needed to meet this challenges. One of the fundamental requirements for lithography with a resolution of 100 nm and below is the development of new high-performance optical designs for projection lenses.

Citation Download Citation

Wilhelm Ulrich, Susanne Beiersdoerfer, and Hans-Juergen Mann "Trends in optical design of projection lenses for UV and EUV lithography", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406667

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