Optimizing style options for subresolution assist features

Lars W. Liebmann; James A. Bruce; William Chu; Michael Cross; Ioana C. Graur; Joshua J. Krueger; William C. Leipold; Scott M. Mansfield; Anne E. McGuire; Dianne L. Sundling

doi:10.1117/12.435690

14 September 2001 Optimizing style options for subresolution assist features

Lars W. Liebmann, James A. Bruce, William Chu, Michael Cross, Ioana C. Graur, Joshua J. Krueger, William C. Leipold, Scott M. Mansfield, Anne E. McGuire, Dianne L. Sundling

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435690
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Sub-resolution assist features (SRAF) have been shown to provide significant process window enhancement and across chip line-width variation reduction when used in conjunction with modified illumination lithography. Work previously presented at this conference has focused on the optimization of sraf design rules that specify the predominantly one dimensional placement and width of assist features as a function of layout pitch. This paper will recount the optimization of SRAF style options that specify how SRAF are to behave in realistic two dimensional circuit layouts. Based on the work done to strike the correct balance between sraf manufacturability, CAD turnaround time, and lithographic benefit in IBM's early product implementation exercises, the evolution of sraf style options is presented. Using simulation as well as exposure data, this paper explores the effect of various two dimensional sraf layout solutions and demonstrates the use of model based verification in the optimization of sraf style options.

Citation Download Citation

Lars W. Liebmann, James A. Bruce, William Chu, Michael Cross, Ioana C. Graur, Joshua J. Krueger, William C. Leipold, Scott M. Mansfield, Anne E. McGuire, and Dianne L. Sundling "Optimizing style options for subresolution assist features", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435690

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