Dense only phase-shift template lithography

Michael Fritze; Brian Tyrrell; Renee D. Mallen; Bruce Wheeler; Peter D. Rhyins; Patrick M. Martin

doi:10.1117/12.485244

10 July 2003 Dense only phase-shift template lithography

Michael Fritze, Brian Tyrrell, Renee D. Mallen, Bruce Wheeler, Peter D. Rhyins, Patrick M. Martin

Proceedings Volume 5042, Design and Process Integration for Microelectronic Manufacturing; (2003) https://doi.org/10.1117/12.485244
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

The steady move towards feature sizes ever deeper in the subwavelength regime has necessitated the increased use of aggressive resolution enhancement techniques (RET) in optical lithography. The use of ever more complex RET methods including strong phase shift masks and complex OPC has led to an alarming increase in the cost of photomasks, which cannot be amortized by many types of semiconductor applications. This paper reviews an alternative RET approach, dense template phase shift lithography, that can substantially reduce the cost of optical RET. The use of simple dense grating templates can also eliminate serious problems encountered in subwavelength lithography including optical proximity and spatial frequency effects. We show that, despite additional design rule restrictions and the use of multiple exposures per critical level, this type of lithography approach can make economic sense depending on the number of wafers produced per critical photomask.

Citation Download Citation

Michael Fritze, Brian Tyrrell, Renee D. Mallen, Bruce Wheeler, Peter D. Rhyins, and Patrick M. Martin "Dense only phase-shift template lithography", Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); https://doi.org/10.1117/12.485244

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