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28 August 2003 Inspection of aggressive OPC using aerial image-based mask inspection
Luke T. H. Hsu, Johnson Chang-Cheng Hung, Hong-Chang Hsieh, Anja Rosenbusch, Reuven Falah, Yuval Blumberg
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504058
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
Inspection of aggressive OPC represents one of the major challenges for today's mask inspection methodologies. Systems are phased with high-density layouts, containing OPC features far below the resolution limit of conventional inspection systems. This causes large amounts of false and nuisance defects, especially on production applications. The paper presents the use of Aera193, a new inspection system using aerial imaging as inspection methodology.
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Luke T. H. Hsu, Johnson Chang-Cheng Hung, Hong-Chang Hsieh, Anja Rosenbusch, Reuven Falah, and Yuval Blumberg "Inspection of aggressive OPC using aerial image-based mask inspection", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504058
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KEYWORDS
Inspection
Optical proximity correction
Heads up displays
Lithium
Airborne remote sensing
Imaging systems
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