Application of spatial light modulators for microlithography

Ulrike A Dauderstaedt; Peter Duerr; Tord Karlin; Harald Schenk; Hubert Lakner

doi:10.1117/12.528798

24 January 2004 Application of spatial light modulators for microlithography

Ulrike A Dauderstaedt, Peter Duerr, Tord Karlin, Harald Schenk, Hubert Lakner

Proceedings Volume 5348, MOEMS Display and Imaging Systems II; (2004) https://doi.org/10.1117/12.528798
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a pro-programable mask, which allows writing up to 1 million pixels with a framerate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of the features.

Citation Download Citation

Ulrike A Dauderstaedt, Peter Duerr, Tord Karlin, Harald Schenk, and Hubert Lakner "Application of spatial light modulators for microlithography", Proc. SPIE 5348, MOEMS Display and Imaging Systems II, (24 January 2004); https://doi.org/10.1117/12.528798

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