Issues associated with the commercialization of phase-shift masks

John L. Nistler; Greg P. Hughes; Andrew J. Muray; James N. Wiley

doi:10.1117/12.56947

1 January 1992 Issues associated with the commercialization of phase-shift masks

John L. Nistler, Greg P. Hughes, Andrew J. Muray, James N. Wiley

Proceedings Volume 1604, 11th Annual BACUS Symposium on Photomask Technology; (1992) https://doi.org/10.1117/12.56947
Event: 11th Annual BACUS Symposium on Photomask Technology, 1991, Sunnyvale, CA, United States

Abstract

Issues associated with the commercialization of phase shift masks are discussed. Design layouts incorporating multiphase transitions and voting are presented along with methods of mask fabrication. Issues associated with mask inspection and repair are discussed, along with data on actual reticles produced using the prescribed method of manufacture. Cost of reticles in relation to potential wafer processing gains are compared along with problems associated with the increased complexity of the mask making process.

Citation Download Citation

John L. Nistler, Greg P. Hughes, Andrew J. Muray, and James N. Wiley "Issues associated with the commercialization of phase-shift masks", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56947

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