Aerial-image-based inspection on subresolution scattering bars

Luke T.H. Hsu; C. C. Lin; Anja Rosenbusch; Yuval Bloomberg; Simon Kurin

doi:10.1117/12.579749

6 December 2004 Aerial-image-based inspection on subresolution scattering bars

Luke T.H. Hsu, C. C. Lin, Anja Rosenbusch, Yuval Bloomberg, Simon Kurin

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.579749
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

The paper presents the results of a study to define a production-worthy inspection technique for subresolution solid and hollow scattering features used in 193-nm lithography. Masks are inspected using conventional high-NA and aerial-imaging-based mask inspection tools. Inspection results are compared regarding capture rate and nuisance defect rate.

Citation Download Citation

Luke T.H. Hsu, C. C. Lin, Anja Rosenbusch, Yuval Bloomberg, and Simon Kurin "Aerial-image-based inspection on subresolution scattering bars", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.579749

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