Joining the design and mask flows for better and cheaper masks

Puneet Gupta; Andrew B. Kahng; Chul-Hong Park; P. Sharma; Dennis M. C. Sylvester; Jun Yang

doi:10.1117/12.594095

6 December 2004 Joining the design and mask flows for better and cheaper masks

Puneet Gupta, Andrew B. Kahng, Chul-Hong Park, P. Sharma, Dennis M. C. Sylvester, Jun Yang

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.594095
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

Today's design-manufacturing interfaces have only minimal information exchange. Lack of information on either side leads to under-performance due to too much guardbanding, and increased mask cost and increased turnaround time due to over-correction. In this work we present techniques that simultaneously utilize design and manufacturing information to improve mask quality and reduce mask cost.

Citation Download Citation

Puneet Gupta, Andrew B. Kahng, Chul-Hong Park, P. Sharma, Dennis M. C. Sylvester, and Jun Yang "Joining the design and mask flows for better and cheaper masks", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.594095

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available