Structural environment of nitrogen in n-doped rutile TiO[sub]2[/sub](110)

M. A. Henderson; V. Shutthanandan; T. Ohsawa; S. A. Chambers

doi:10.1117/12.862297

24 August 2010 Structural environment of nitrogen in n-doped rutile TiO₂(110)

M. A. Henderson, V. Shutthanandan, T. Ohsawa, S. A. Chambers

Proceedings Volume 7770, Solar Hydrogen and Nanotechnology V; 777007 (2010) https://doi.org/10.1117/12.862297
Event: SPIE Solar Energy + Technology, 2010, San Diego, California, United States

Abstract

We employ x-ray photoelectron spectroscopy (XPS), reflection high-energy electron diffraction (RHEED) and nuclear reaction analysis (NRA) to characterize the concentration-dependent structural properties of nitrogen doping into rutile TiO2. High quality N-doped TiO₂ were prepared on rutile single crystal TiO₂(110) substrates using plasma-assisted molecular beam epitaxy with an electron cyclotron resonance (ECR) plasma and Ti effusive sources. Films with N dopant concentrations at or below 2 at.% exhibited predominately substitutional doping based on NRA data, whereas films with concentrations above this limit resulted in little or no substitutional N and surfaces rich in Ti3⁺ . The binding energy of the N 1s feature in XPS did not readily distinguish between these two extremes in N-doping, rendering features within 0.4 eV of each other and similar peak profiles. Although widely used to characterize the state of N in anion-doped TiO₂ materials, we find that XPS is unsuitable for this task.

Citation Download Citation

M. A. Henderson, V. Shutthanandan, T. Ohsawa, and S. A. Chambers "Structural environment of nitrogen in n-doped rutile TiO₂(110)", Proc. SPIE 7770, Solar Hydrogen and Nanotechnology V, 777007 (24 August 2010); https://doi.org/10.1117/12.862297

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