Paper
1 April 2010 Nanofabrication with a helium ion microscope
Diederik Maas, Emile van Veldhoven, Ping Chen, Vadim Sidorkin, Huub Salemink, Emile . van der Drift, Paul Alkemade
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Abstract
The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diederik Maas, Emile van Veldhoven, Ping Chen, Vadim Sidorkin, Huub Salemink, Emile . van der Drift, and Paul Alkemade "Nanofabrication with a helium ion microscope", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763814 (1 April 2010); https://doi.org/10.1117/12.862438
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Cited by 43 scholarly publications.
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KEYWORDS
Helium

Ions

Nanofabrication

Ion beams

Scanning helium ion microscopy

Electron beam lithography

Ion beam lithography

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