Refractive Index Measurement During The Deposition Of Dielectric Coatings

Andreas Englisch; Johannes Ebert

doi:10.1117/12.935499

28 November 1983 Refractive Index Measurement During The Deposition Of Dielectric Coatings

Andreas Englisch, Johannes Ebert

Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935499
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Refractive indices and index profiles of dielectric coatings have been measured during their deposition. The measurements can be applied in the case of single layers as well as complex layer systems with arbitrary layer thicknesses. The refractive index of homogeneous layers is investigated using transmission measurements of monochromatic light, whereas inhomogeneous layer profiles are measured at different wavelengths.With an accurately determined index, the production of special dielectric multilayer stacks as steep edge filters or antireflection coatings with low residual reflection can be realized. Thus it is possible to reach the theoretical steepness by monitoring the actual refractive index and correcting the layer thickness accordingly. Considering inhomogeneities the performance of antireflection coatings can be improved.

Citation Download Citation

Andreas Englisch and Johannes Ebert "Refractive Index Measurement During The Deposition Of Dielectric Coatings", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935499

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