Abstract
Mutual diffusion at the interface in a two-dimensional Ni-Al system has been studied by the method of molecular dynamics. It is established that the main diffusion mechanism consists in correlated jumps of atoms over the vacancies near misfit dislocation cores.
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References
B. S. Bokshtein, Diffusion in Metals (Metallurgiya, Moscow, 1978).
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A. I. Tsaregorodtsev, N. V. Gorlov, B. F. Dem’yanov, et al., Fiz. Met. Metalloved. 58, 336 (1984).
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 29, No. 11, 2003, pp. 30–34.
Original Russian Text Copyright © 2003 by Poletaev, Starostenkov.
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Poletaev, G.M., Starostenkov, M.D. Mutual diffusion at the interface in a two-dimensional Ni-Al system. Tech. Phys. Lett. 29, 454–455 (2003). https://doi.org/10.1134/1.1589555
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DOI: https://doi.org/10.1134/1.1589555