Abstract
The temperature dependence of the electric resistance of the In-GaP ohmic contact has been studied in the range from 77 to 420 K. The resistance was measured in GaP plates of various thickness with two In ohmic contacts. The measured ohmic contact resistance increases with temperature in the interval from 230–420 K. It is suggested that the In-GaP ohmic contact is formed by metallic shunts appearing upon deposition of In atoms on dislocations and other imperfections present (with a density evaluated at (4.5–8)×107 cm−2) in the subsurface region of the semiconductor.
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 30, No. 19, 2004, pp. 17–24.
Original Russian Text Copyright © 2004 by Blank, Goldberg, Konstantinov, Nikitin, Posse.
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Blank, T.V., Goldberg, Y.A., Konstantinov, O.V. et al. Peculiarities in the mechanism of current flow through an ohmic contact to gallium phosphide. Tech. Phys. Lett. 30, 806–809 (2004). https://doi.org/10.1134/1.1813716
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DOI: https://doi.org/10.1134/1.1813716