Abstract
The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si[111]‖Fe3Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy (H a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz.
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Original Russian Text © I.A. Yakovlev, S.N. Varnakov, B.A. Belyaev, S.M. Zharkov, M.S. Molokeev, I.A. Tarasov, S.G. Ovchinnikov, 2014, published in Pis’ma v Zhurnal Eksperimental’noi i Teoreticheskoi Fiziki, 2014, Vol. 99, No. 9, pp. 610–613.
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Yakovlev, I.A., Varnakov, S.N., Belyaev, B.A. et al. Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films. Jetp Lett. 99, 527–530 (2014). https://doi.org/10.1134/S0021364014090124
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DOI: https://doi.org/10.1134/S0021364014090124