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Morphology of anodic alumina films obtained by hard anodization: Influence of the rate of anodization voltage increase

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Abstract

The influence of the anodization voltage ramp on the morphology and thickness homogeneity of porous anodic alumina films was studied. The samples were prepared in the oxalic acid at 120 V during the hard anodization process. As a nondestructive characterization method, the smallangle Xray scattering technique was used. The analysis of diffraction patterns allows determining the mean value and dispersion of interpore distance and the channel tortuosity with high accuracy. The increase of voltage ramp at the initial stage of hard anodization process was shown to lead to reduction of mechanical deformation (tortuosity) of anodic alumina film during crystallization.

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References

  1. G. D. Bengough and J. M. Stuart, GB Patent No. 223994 (1923).

    Google Scholar 

  2. F. Keller, M. S. Hunter, and D. L. Robinson, J. Electrochem. Soc. 100, 411 (1953). doi: 10.1149/1.2781142

    Article  Google Scholar 

  3. F. P. Zalivalov, M. N. Tyukina, and N. D. Tomashov, J. Russ. Phys. Chem. Soc. 35, 429 (1961).

    Google Scholar 

  4. J. P. O’Sullivan and G. C. Wood, Proc. R. Soc. London A: Math. Phys. Sci. 317, 511 (1970). doi: 10.1098/rspa.1970.0129

    Article  Google Scholar 

  5. R. G. Valeev, A. N. Deev, A. N. Beltyukov, E. A. Romanov, V. V. Kriventsov, N. A. Mezentsev, A. A. Eliseev, and K. S. Napolskii, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 4, 645 (2010). doi: 10.1134/S102745101004018X

    Article  Google Scholar 

  6. S. V. Grigoriev, A. P. Chumakov, N. A. Grigoryeva, H. Eckerlebe, I. V. Roslyakov, K. S. Napolskii, and A. A. Eliseev, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 8, 1010 (2014). doi: 10.1134/S1027451014050280

    Article  Google Scholar 

  7. D. I. Petukhov, A. A. Eliseev, D. A. Buldakov, K. S. Napolskii, A. V. Lukashin, Yu. D. Tret’yakov, and Yu. P. Yampol’skii, Membrany, No. 3 (43), 16 (2009).

    Google Scholar 

  8. D. A. Buldakov, D. I. Petukhov, N. S. Borodinov, and A. A. Eliseev, Al’tern. Energet. Ekol., No. 8, 101 (2013).

    Google Scholar 

  9. I. V. Gasenkova, L. M. Lyn’kov, N. I. Mukhurov, and M. V. Yasin, Pribory, No. 12, 15 (2013).

    Google Scholar 

  10. V. A. Gudkov, M. P. Dukhnovskii, Y. Y. Fedorov, A. S. Vedeneev, A. M. Kozlov, V. V. Ryl’kov, M. P. Temiryazeva, and A. S. Bugaev, J. Commun. Technol. Electron. 58, 72 (2013). doi: 10.1134/S1064226913010051

    Article  Google Scholar 

  11. K. S. Napolskii, I. V. Roslyakov, A. A. Eliseev, A. V. Lukashin, V. A. Lebedev, D. M. Itkis, and Yu. D. Tret’yakov, Al’tern. Energet. Ekol., No. 11, 86 (2009).

    Google Scholar 

  12. H. Masuda and K. Fukuda, Science (Washington, D.C.) 268, 1466 (1995). doi:10.1126/science.268.5216.1466

    Article  Google Scholar 

  13. W. Lee, R. Ji, U. Gosele, and K. Nielsch, Nature Mater. 5, 741 (2006). doi: 10.1038/nmat1717

    Article  Google Scholar 

  14. A. Santos, P. Formentin, J. Ferre-Borrull, J. Pallares, and L. F. Marsal, Mater. Lett. 67, 296 (2012). doi:10.1016/j.matlet.2011.09.101

    Article  Google Scholar 

  15. A. Santos, J. M. Montero-Moreno, J. Bachmann, K. Nielsch, P. Formentin, J. Ferre-Borrull, J. Pallares, and L. F. Marsal, ACS Appl. Mater. Interfaces 3, 1925 (2011). doi:10.1021/am200139k

    Article  Google Scholar 

  16. W. Bras, I. P. Dolbnya, D. Detollenaere, R. van Tol, M. Malfois, G. N. Greaves, A. J. Ryan, and E. Heeley, J. Appl. Crystallogr. 36, 791 (2003). doi: 10.1107/S002188980300400X

    Article  Google Scholar 

  17. A. V. Petukhov, J. H. J. Thijssen, D. C. Hart, A. Imhof, A. van Blaaderen, I. P. Dolbnya, A. Snigirev, A. Moussaid, and I. Snigireva, J. Appl. Crystallogr. 39, 137 (2006). doi: 10.1107/S0021889805041774

    Article  Google Scholar 

  18. J. H. J. Thijssen, A. V. Petukhov, D. C. Hart, A. Imhof, C. H. M. van der Werf, R. E. I. Schropp, and A. van Blaaderen, Adv. Mater. 18, 1662 (2006). doi: 10.1002/adma.200502732

    Article  Google Scholar 

  19. A. Snigirev, V. Kohn, I. Snigireva, and B. Lengeler, Nature 384, 49 (1996). doi:10.1038/384049a0

    Article  Google Scholar 

  20. D. I. Petukhov, K. S. Napolskii, and A. A. Eliseev, Nanotecnology 23, 335601 (2012). doi:10.1088/09574484/23/33/335601

    Article  Google Scholar 

  21. K. S. Napolskii, I. V. Roslyakov, A. A. Eliseev, A. V. Petukhov, D. V. Byelov, N. A. Grigoryeva, W. G. Bouwman, A. V. Lukashin, K. O. Kvashnina, A. P. Chumakov, et al., J. Appl. Crystallogr. 43, 531 (2010). doi: 10.1107/S0021889810009131

    Article  Google Scholar 

  22. I. V. Roslyakov, A. A. Eliseev, E. V. Yakovenko, A. V. Zabelin, and K. S. Napolskii, J. Appl. Crystallogr. 46, 1705 (2013). doi: 10.1107/S002188981302579X

    Article  Google Scholar 

  23. I. V. Roslyakov, K. S. Napolskii, P. V. Evdokimov, F. S. Napolskii, A. V. Dunaev, A. A. Eliseev, A. V. Lukashin, and Yu. D. Tret’yakov, Nanosist.: Fiz., Khim., Mat. 4, 120 (2013).

    Google Scholar 

  24. I. V. Gasenkova and E. V. Ostapenko, J. Surf. Invest.: X-Ray, Synchrotr. Neutron Tech. 7, 536 (2013). doi: 10.1134/S1027451013030245

    Article  Google Scholar 

  25. D. I. Petukhov, K. S. Napolskii, M. V. Berekchiyan, A. G. Lebedev, and A. A. Eliseev, ACS Appl. Mater. Interfaces 5, 7819 (2013). doi: 10.1021/am401585q

    Article  Google Scholar 

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Authors and Affiliations

  1. Department of Materials Science, Lomonosov Moscow State University, Moscow, 119991, Russia

    I. V. Roslyakov, N. S. Kuratova, A. V. Lukashin & K. S. Napolskii

  2. Department of Chemistry, Lomonosov Moscow State University, Moscow, 119991, Russia

    I. V. Roslyakov, A. V. Lukashin & K. S. Napolskii

  3. Foundation “National Intellectual Development”, Moscow, 119991, Russia

    I. V. Roslyakov, A. V. Lukashin & K. S. Napolskii

  4. National Research University of Electronic Technology, Zelenograd, Moscow, 124498, Russia

    D. S. Koshkodaev

  5. DUBBLE CRG ESRF BM26, F-38043, Grenoble Cedex, France

    D. Hermida Merino

Authors
  1. I. V. Roslyakov
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  2. N. S. Kuratova
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  3. D. S. Koshkodaev
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  4. D. Hermida Merino
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  5. A. V. Lukashin
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  6. K. S. Napolskii
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Correspondence to I. V. Roslyakov.

Additional information

Original Russian Text © I.V. Roslyakov, N.S. Kuratova, D.S. Koshkodaev, D. Hermida Merino, A.V. Lukashin, K.S. Napolskii, 2016, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2016, No. 2, pp. 39–46.

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Roslyakov, I.V., Kuratova, N.S., Koshkodaev, D.S. et al. Morphology of anodic alumina films obtained by hard anodization: Influence of the rate of anodization voltage increase. J. Surf. Investig. 10, 191–197 (2016). https://doi.org/10.1134/S1027451016010298

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  • DOI: https://doi.org/10.1134/S1027451016010298

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