Abstract
A computer program has been developed for the three-dimensional calculation of the absorbed energy density in polymer films on substrates in electron beam lithography. In this calculation the Monte Carlo results have been used for the radial energy intensity distribution for a point source electron beam. The program is based on the reciprocity principle proposed by Chang. Some exposure experiments have been conducted with an electron resist of PMMA (polymethyl methacrylate) for isolated patterns in the from of a line of finite length (8.1 µm) as well as of a rectangle (3.1×8.1 µm2) in order to check the reliability of the calculations. Operating beam voltages used for the investigation are 14 and 20 keV. The electron resist thickness is 8000 A. Relatively good agreement has been obtained between the calculated and the experimental results. This program is applicable to an arbitraty pattern, and therefore it will be useful for investigations of the proximity effect in electron beam lithography.