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Preparation of Nd-Doped SiO2 Glasses by Axial Injection Plasma Torch CVD and Their Fluorescence Properties

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Copyright (c) 1984 The Japan Society of Applied Physics
, , Citation Hiroshi Namikawa et al 1984 Jpn. J. Appl. Phys. 23 L409 DOI 10.1143/JJAP.23.L409

1347-4065/23/6A/L409

Abstract

To prepare Nd-doped SiO2 glasses by axial injection plasma torch CVD, a special type of NdCl3 gas generator for axial injection was developed and its optimum operating conditions were examined. The technical advantages and disadvantages of this method were discussed in comparison with previously reported tail injection plasma torch CVD. Although a large difference exists between these two methods, little difference in the fluorescence properties of the resultant glasses was observed.

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10.1143/JJAP.23.L409