200 kV Mass-Separated Fine Focused Ion Beam Apparatus

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Copyright (c) 1985 The Japan Society of Applied Physics
, , Citation Takao Shiokawa et al 1985 Jpn. J. Appl. Phys. 24 L566 DOI 10.1143/JJAP.24.L566

1347-4065/24/7A/L566

Abstract

A 200 kV mass-separated focused ion beam apparatus using alloy liquid metal ion sources has been developed. Focusing characteristics have been estimated by scanning ion microscope images of the metal mesh and the sputter etching pattern fabricated by the focused ion beam. A beam diameter smaller than 80 nm was obtained for Ga+ with 100 pA at 200 kV.

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10.1143/JJAP.24.L566