Fine Particles of Silicon. I. Crystal Growth of Spherical Particles of Si

Copyright (c) 1987 The Japan Society of Applied Physics
, , Citation Sumio Iijima 1987 Jpn. J. Appl. Phys. 26 357 DOI 10.1143/JJAP.26.357

1347-4065/26/3R/357

Abstract

Fine crystals of Si having spherical shapes of less than 200 nm, as well as hybrid particles of Si and β-SiC were prepared by a gas evaporation method using an arc discharge as the heat source. Si particles always contain stacking faults and twins which are categorized as growth faults. All the planar faults in a particle occur in the same orientation (parallel to a [110] direction). The nature of these planar faults was examined in terms of crystal growth using an electron microscope. As a result, it has been concluded that these spherical Si particles are crystallized from liquid droplets which condense from Si vapors.

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10.1143/JJAP.26.357