The Influence of the Si-H2 Bond on the Light-Induced Effect in a-Si Films and a-Si Solar Cells

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Copyright (c) 1989 The Japan Society of Applied Physics
, , Citation Noboru Nakamura et al 1989 Jpn. J. Appl. Phys. 28 1762 DOI 10.1143/JJAP.28.1762

1347-4065/28/10R/1762

Abstract

The influence of the Si-H2 bond on light-induced degradation and the thermal recovery of a-Si films and a-Si solar cells were studied. The influence of the Si-H2 bond on light-induced degradation depends on the impurity content in a-Si films, and light-induced degradation can be reduced by decreasing the Si-H2 bond density in a-Si films with impurity content of 1018 cm-3. The activation energy of the thermal recovery process was about 1.0 eV, and it did not depend on the Si-H2 bond density. However, an irreversible phenomenon was observed in film properties and solar cell characteristics with high Si-H2 bond density. It is thought that the structural flexibility of the Si-H2 bond is related to this irreversible phenomenon.

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10.1143/JJAP.28.1762