Chemical Structure of Aluminum/8-Hydroxyquinoline Aluminum Interface

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Copyright (c) 2000 The Japan Society of Applied Physics
, , Citation Noritake Isomura et al 2000 Jpn. J. Appl. Phys. 39 L312 DOI 10.1143/JJAP.39.L312

1347-4065/39/4A/L312

Abstract

The chemical structure of interfaces between aluminum (Al) and 8-hydroxyquinoline aluminum (Alq3) has been studied by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (TOF-SIMS). New subpeaks of N1s and O1s in XPS spectra were observed after the deposition of Al on Alq3. The secondary ion intensity of quinoline in TOF-SIMS spectra was found to increase with Al coverage on Alq3. We, therefore, conclude that Alq3 is decomposed by the deposition of Al on Alq3, and that quinoline is formed at the Al/Alq3 interface.

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10.1143/JJAP.39.L312