Characterisation of Multiple Carrier Transport in Indium Nitride Grown by Molecular Beam Epitaxy

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Published 13 October 2006 Copyright (c) 2006 The Japan Society of Applied Physics
, , Citation Tamara B. Fehlberg et al 2006 Jpn. J. Appl. Phys. 45 L1090 DOI 10.1143/JJAP.45.L1090

1347-4065/45/10L/L1090

Abstract

Transport properties of two distinct electron species in indium nitride grown by molecular beam epitaxy (MBE) have been measured. Variable field Hall and resisitivity voltages were used in a quantitative mobility spectrum analysis (QMSA) to extract the concentrations and mobilities of the two electron species, attributed to the bulk electrons and a surface accumulation layer. Single magnetic field data corresponds to neither electron species. The bulk electron distribution has an extracted average mobility of 3570 cm2/(V s) at 300 K, which rises to over 5100 cm2/(V s) at 150 K. Bulk electron concentration in the sample is 1.5 ×1017 cm-3 . The surface electrons have a higher sheet charge density and an order of magnitude lower average mobility than those in the bulk.

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