Abstract
Orientation‐dependent etching of silicon by aqueous 
is a standard procedure in the microelectronics industry. We have measured the etching products by recording the Raman spectra in real time as the etching of {100} silicon progressed in a 
solution. The primary etching species has been determined to be OH−, and the etching products have been determined to be the silicate 
. Isopropyl alcohol does not appear to participate chemically in the etching process.