Azide Photoresists for Deep U.V. Lithography

, and

© 1980 ECS - The Electrochemical Society
, , Citation T. Iwayanagi et al 1980 J. Electrochem. Soc. 127 2759 DOI 10.1149/1.2129591

Download Article PDF

Article metrics

32 Total downloads

Share this article

Author affiliations

1 Hitachi Limited, Central Research Laboratory, Kokubunji, Tokyo, Japan

Dates

  1. Received 10 June 1980
  2. Revised 3 September 1980

Buy this article in print

Journal RSS
Sign up for new issue notifications
1945-7111/127/12/2759

Abstract

Abstract not Available.

Export citation and abstract BibTeX RIS

Previous article in issue
Next article in issue
10.1149/1.2129591