Abstract
The deposition rates and uniformity in CVD reactors are functions of transport phenomena. It is necessary to understand these phenomena as completely as possible in order to design and use reactors properly. In the last few years several, mostly theoretical, discussions of transport phenomena in CVD reactors appeared. In the present study we discuss the results of the experimental measurements of these phenomena by means of flow visualization techniques and temperature and concentration measurements. These measurements suggest a model of flow somewhat different than models suggested by other authors. The importance of entry effects and influences on the development of velocity and temperature profiles are illustrated. Such a model is more complex than models where the fully developed velocity and/or temperature fields are assumed, but it is also more descriptive of the true situation in the reactor.