Abstract
Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.