In low-pressure plasmas commonly used in materials processing, plasma–wall inter-actions play a crucial role in the evolution of the plasma properties both over time and across large-area wafers. We have recently studied the heterogeneous recombination of O and Cl atoms on reactor walls in O2 and Cl2 plasmas through both experiments and modeling. The Langmuir–Hinshelwood (i.e., delayed) recombination was investigated using a “spinning-wall” technique in which a portion of the substrate surface is periodically exposed to an inductively coupled plasma and to a differentially pumped chamber where either Auger electron spectroscopy (AES) or line-of-sight mass spectrometry (MS) is used to detect surface and desorbing species. In this paper, a review of the various effects driving the O and Cl atoms recombination dynamics on anodized aluminum (AA) and stainless steel (SS) surfaces is presented. It is shown that recombination probabilities, γ, can vary following plasma exposure due to surface conditioning. In Cl2 plasmas, γ was also found to depend on the Cl-to-Cl2 number density ratio, a mechanism ascribed to a competition for adsorption sites between Cl and Cl2. We have also determined the recombination rates of Cl atoms in Cl2 high-density plasmas sustained by electromagnetic surface waves by comparing the measured degrees of dissociation of Cl2 to those predicted by an isothermal fluid model. For a reactor with large SS and quartz surfaces exposed to the plasma, γ values and their dependence on the Cl-to-Cl2 number density ratio were consistent with those obtained from the rotating substrate technique. Similar values were obtained for plasmas sustained in a quartz discharge tube. It is expected that for plasmas sustained in or adjacent to a silica tube or plate, the Cl atoms recombination coefficient becomes independent of chamber wall material due to reactor seasoning, producing a silicon-oxychloride layer.
Conference
International Symposium on Plasma Chemistry (ISPC-19), International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, 19th, Bochum, Germany, 2009-07-26–2009-07-31
References
1 10.1021/la020584d, F. Dreux, S. Marais, F. Poncin-Epaillard, M. Metayer, M. Labbé. Langmuir18, 10411 (2002).Search in Google Scholar
2 10.1063/1.346598, D. A. Carl, D. W. Hess, M. A. Lieberman. J. Appl. Phys.68, 1859 (1990).Search in Google Scholar
3 10.1063/1.325382, C. J. Mogab, A. C. Adams, D. L. Flamm. J. Appl. Phys.49, 3796 (1978).Search in Google Scholar
4 10.1063/1.116071, S. Samukawa. Appl. Phys. Lett.68, 316 (1996).Search in Google Scholar
5 10.1116/1.3058710, R. Ramos, G. Cunge, O. Joubert, T. Lill. J. Vac. Sci. Technol. B27, 113 (2009).Search in Google Scholar
6 10.1116/1.1627771, L. Sha, J. P. Chang. J. Vac. Sci. Technol. A22, 88 (2004).Search in Google Scholar
7 10.1016/j.apsusc.2006.05.052, W. T. Lim, L. Stafford, J. I. Song, J. S. Park, Y. W. Heo, J. H. Lee, J. J. Kim, S. J. Pearton. Appl. Surf. Sci.253, 2752 (2006).Search in Google Scholar
8 10.1063/1.3223350, P.-M. Bérubé, J.-S. Poirier, J. Margot, L. Stafford, P. F. Ndione, M. Chaker, R. Morandotti. J. Appl. Phys.106, 063302 (2009).Search in Google Scholar
9 10.1116/1.1577130, L. Stafford, J. Margot, O. Langlois, M. Chaker. J. Vac. Sci. Technol. A21, 1247 (2003).Search in Google Scholar
10 10.1149/1.1838670, J. J. Wang, J. R. Childress, S. J. Pearton, F. Sharifi, K. H. Dahmen, E. S. Gillman, F. J. Cadieu, R. Rani, X. R. Qian, C. Li. J. Electrochem. Soc.145, 2512 (1998).Search in Google Scholar
11 10.1116/1.1481868, A. P. Mahorowala, H. H. Sawin. J. Vac. Sci. Technol. B20, 1077 (2002).Search in Google Scholar
12 10.1007/BF01465219, C. Lee, D. B. Graves, M. A. Lieberman. Plasma Chem. Plasma Processing16, 99 (1996).Search in Google Scholar
13 10.1007/BF00566029, M. L. Brake, R. L. Kerber. Plasma Chem. Plasma Processing3, 79 (1983).Search in Google Scholar
14 10.1063/1.352113, S. C. Deshmukh, D. J. Economou. J. Appl. Phys.72, 4597 (1992).Search in Google Scholar
15 10.1116/1.579366, C. M. Lee, M. A. Lieberman. J. Vac. Sci. Technol. A13, 368 (1995).Search in Google Scholar
16 10.1063/1.349662, J. P. Booth, N. Sadeghi. J. Appl. Phys.70, 611 (1991).Search in Google Scholar
17 10.1063/1.1490630, S. Gomez, P. G. Steen, W. G. Graham. Appl. Phys. Lett.81, 19 (2002).Search in Google Scholar
18 10.1016/S0169-4332(00)00007-6, M. Mozetic, A. Zalar. Appl. Surf. Sci.158, 263 (2000).Search in Google Scholar
19 10.1116/1.580982, G. P. Kota, J. W. Coburn, D. B. Graves. J. Vac. Sci. Technol. A16, 270 (1998).Search in Google Scholar
20 10.1063/1.368010, M. V. Malyshev, V. M. Donnelly, A. Kornblit, N. A. Ciampa. J. Appl. Phys.84, 137 (1998).Search in Google Scholar
21 10.1063/1.2037873, L. Stafford, J. Margot, F. Vidal, M. Chaker, K. Giroux, J. S. Poirier, A. Quintal-Léonard, J. Saussac. J. Appl. Phys.98, 063301 (2005).Search in Google Scholar
22 10.1063/1.1321777, M. V. Malyshev, V. M. Donnelly. J. Appl. Phys.88, 6207 (2000).Search in Google Scholar
23 10.1149/1.1554294, G. W. Lee, Y. B. Kang. Electrochem. Solid State Lett.6, G49 (2003).Search in Google Scholar
24 10.1116/1.1511216, K. Miwa, T. Mukai. J. Vac. Sci. Technol. B20, 2120 (2002).Search in Google Scholar
25 10.1063/1.1619575, G. Cunge, O. Joubert, N. Sadeghi. J. Appl. Phys.94, 6285 (2003).Search in Google Scholar
26 10.1116/1.2909966, A. Agarwal, M. J. Kushner. J. Vac. Sci. Technol. A26, 498 (2008).Search in Google Scholar
27 10.1149/1.1578481, T. W. Kim, E. S. Aydil. J. Electrochem. Soc.150, G418 (2003).Search in Google Scholar
28 10.1021/jp054190h, P. F. Kurunczi, J. Guha, V. M. Donnelly. J. Phys. Chem. B109, 20989 (2005).Search in Google Scholar PubMed
29 10.1103/PhysRevLett.96.018306, P. F. Kurunczi, J. Guha, V. M. Donnelly. Phys. Rev. Lett.96, 018306-1 (2006).Search in Google Scholar PubMed
30 10.1116/1.2699167, J. Guha, Y.-K. Pu, V. M. Donnelly. J. Vac. Sci. Technol. A25, 347 (2006).Search in Google Scholar
31 10.1063/1.2828154, J. Guha, V. M. Donnelly, Y.-K. Pu. J. Appl. Phys.103, 013306 (2008).Search in Google Scholar
32 10.1116/1.2902953, L. Stafford, J. Guha, V. M. Donnelly. J. Vac. Sci. Technol. A26, 455 (2008).Search in Google Scholar
33 10.1021/jp800788a, J. Guha, P. Kurunczi, L. Stafford, V. M. Donnelly, Y.-K. Pu. J. Phys. Chem. C112, 8963 (2008).Search in Google Scholar
34 10.1088/0022-3727/42/5/055206, L. Stafford, R. Khare, J. Guha, V. M. Donnelly, J.-S. Poirier, J. Margot. J. Phys. D: Appl. Phys.42, 055206 (2009).Search in Google Scholar
35 10.1063/1.3143107, J. Guha, R. Khare, L. Stafford, V. M. Donnelly, S. Sirard, E. A. Hudson. J. Appl. Phys.105, 113309 (2009).Search in Google Scholar
36 10.1063/1.3129543, J. Guha, V. M. Donnelly. J. Appl. Phys.105, 113307 (2009).Search in Google Scholar
37 10.1116/1.3106608, J. Guha, V. M. Donnelly. J. Vac. Sci. Technol. A27, 515 (2009).Search in Google Scholar
38 10.1021/la00060a016, Y. C. Kim, M. Boudart. Langmuir7, 2999 (1991).Search in Google Scholar
39 10.1116/1.580982, G. P. Kota, J. W. Coburn, D. B. Graves. J. Vac. Sci. Technol. A16, 270 (1998).Search in Google Scholar
40 10.1109/TPS.2007.902028, V. Guerra. IEEE Trans. Plasma Sci.35, 1397 (2007).Search in Google Scholar
41 10.1039/tf9595501346, J. C. Greaves, J. W. Linnett. Trans. Faraday Soc.55, 1346 (1959).Search in Google Scholar
42 10.1039/tf9646001272, P. G. Dickens, M. B. Sutcliffe. Trans. Faraday Soc.60, 1272 (1964).Search in Google Scholar
43 10.1088/0022-3727/39/15/009, C.-C. Hsu, M. A. Nierode, J. W. Coburn, D. B. Graves. J. Phys. D39, 3272 (2006).Search in Google Scholar
44 10.1063/1.1289046, H. Singh, J. W. Coburn, D. B. Graves. J. Appl. Phys.88, 3748 (2000).Search in Google Scholar
45 10.1116/1.1564024, M. W. Kiehlbauch, D. B. Graves. J. Vac. Sci. Technol. A21, 660 (2003).Search in Google Scholar
46 10.1016/S0169-4332(00)00007-6, M. Mozetic, A. Zalar. Appl. Surf. Sci.158, 263 (2000).Search in Google Scholar
47 J. Matsushita, K. Sasaki, K. Kadota. Jpn. J. Appl. Phys.36, Part 1, 4747 (1997).10.1143/JJAP.36.4747Search in Google Scholar
48 10.1063/1.2803881, G. Cunge, N. Sadeghi, R. Ramos. J. Appl. Phys.102, 093305 (2007).Search in Google Scholar
49 10.1116/1.3006029, S. Imai. J. Vac. Sci. Technol. A27, 1 (2009).Search in Google Scholar
50 E. A. Hudson, S. Sirard. Unpublished.Search in Google Scholar
51 G. Delgadino, D. Keil, J. Booth, C. Lee. Proceedings of the Dry Process International Symposium, Vol. 13 (unpublished) (2007).Search in Google Scholar
52 10.1021/j100129a021, J. Valyon, W. K. Hall. J. Phys. Chem.97, 7054 (1993).Search in Google Scholar
53 10.1021/j100162a053, M. Iwamoto, H. Yahiro, K. Tanda, N. Mizuno, Y. Mine, S. Kagawa. J. Phys. Chem.95, 3727 (1991).Search in Google Scholar
54 10.1007/BF00769481, D.-J. Liu, H. J. Robota. Catal. Lett.21, 291 (1993).Search in Google Scholar
55 10.1007/BF00811794, J. Valyon, W. S. Millman, W. K. Hall. Catal. Lett.24, 215 (1994).Search in Google Scholar
56 10.1016/0021-9517(82)90317-7, J. O. Petunchi, W. K. Hall. J. Catal.78, 327 (1982).Search in Google Scholar
57 10.1116/1.1421602, S. J. Ullal, A. R. Godfrey, E. Edelberg, L. Braly, V. Vahedi, E. S. Aydil. J. Vac. Sci. Technol. A20, 43 (2002).Search in Google Scholar
58 10.1116/1.1450578, S. J. Ullal, H. Singh, V. Vahedi, E. S. Aydil. J. Vac. Sci. Technol. A20, 499 (2002).Search in Google Scholar
59 10.1063/1.359032, A. D. Tserepi, T. A. Miller. J. Appl. Phys.77, 505 (1995).Search in Google Scholar
60 10.1063/1.1538313, L. Stafford, J. Margot, M. Chaker, O. Pauna. J. Appl. Phys.93, 1907 (2003).Search in Google Scholar
61 10.1063/1.1318727, V. M. Donnelly, M. V. Malyshev. Appl. Phys. Lett.77, 2467 (2000).Search in Google Scholar
62 10.1116/1.580137, V. M. Donnelly. J. Vac. Sci. Technol. A14, 1076 (1996).Search in Google Scholar
63 10.1088/0022-3727/41/18/185202, C. S. Corr, E. Despiau-Pujo, P. Chabert, W. G. Graham, F. G. Marro, D. B. Graves. J. Phys. D: Appl. Phys.41, 185202 (2008).Search in Google Scholar
64 10.1063/1.339735, A. D. Richards, H. H. Sawin. J. Appl. Phys.62, 799 (1987).Search in Google Scholar
65 10.1088/0022-3727/24/7/001, M. Moisan, Z. Zakrzewski. J. Phys D: Appl. Phys.24, 1025 (1991).Search in Google Scholar
66 10.1063/1.3072364, L. Stafford, R. Khare, V. M. Donnelly, J. Margot, M. Moisan. Appl. Phys. Lett.94, 021503 (2009).Search in Google Scholar
67 10.1029/RS023i006p01120, J. Margot-Chaker, M. Moisan, Z. Zakrzewski, V. M. Galude, G. Sauvé. Radio Sci.23, 1120 (1988).Search in Google Scholar
68 10.1088/0022-3727/37/19/R01, V. M. Donnelly. J. Phys. D: Appl. Phys.37, R217 (2004).Search in Google Scholar
69 10.1139/v61-337, E. A. Ogryzlo. Can. J. Chem.39, 2556 (1961).Search in Google Scholar
70 10.1143/JJAP.30.2897, S. Wickramanayaka, N. Hosokawa, Y. Hatanaka. Jpn. J. Appl. Phys.30, 2897 (1991).Search in Google Scholar
© 2013 Walter de Gruyter GmbH, Berlin/Boston