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On the microstructure, chemistry, and dielectric function of BaTiO3 MOCVD thin films

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Abstract

Thin films of BaTiO3 deposited on (100)LaAlO3 substrate by metal-organic chemical vapor deposition (MOCVD) are investigated using several electron-optical techniques. Combined high resolution transmission electron microscopy (HRTEM), electron energy loss spectrometry (EELS), and convergent beam electron diffraction (CBED) indicate a substantial influence of lattice strain on the structural and optical characteristics of BaTiO3 films. Spatially resolved EELS and CBED studies indicate that the substrate influence persists up to about 40 nm away from the interface. The changes in the dielectric function of the films, as inferred from spatially resolved EELS, appear to correlate well with internal lattice strain in the films as deduced from convergent beam electron diffraction (CBED).

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Authors and Affiliations

  1. Department of Materials Science and Engineering, and Materials Research Center, Northwestern University, Evanston, Illinois, 60208-3108, USA

    V. P. Dravid, H. Zhang, L. A. Wills & B. W. Wessels

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  1. V. P. Dravid
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  2. H. Zhang
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  3. L. A. Wills
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  4. B. W. Wessels
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Dravid, V.P., Zhang, H., Wills, L.A. et al. On the microstructure, chemistry, and dielectric function of BaTiO3 MOCVD thin films. Journal of Materials Research 9, 426–430 (1994). https://doi.org/10.1557/JMR.1994.0426

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  • DOI: https://doi.org/10.1557/JMR.1994.0426

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