Abstract
Na0.5K0.5NbO3 thin films have been deposited onto textured polycrystalline Pt80Ir20 substrates using radio frequency magnetron sputtering. Films were grown in off- and on-axis positions relative to the target at growth temperatures of 500–700 °C and sputtering pressures of 1–7 Pa. The deposited films were found to be textured, displaying a mixture of two orientations (001) and (101). Films grown on-axis showed a prefered (001) orientation, while the off-axis films had a (101) orientation. Scanning electron microscopy showed that the morphology of the films was dependent on the substrate position and sputtering pressure. The low-frequency (10 kHz) dielectric constants of the films were found to be in the range of approximately 490–590. Hydrostatic piezoelectric measurements showed that the films were piezoelectric in the as-deposited form with a constant up to 14.5 pC/N.
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Wang, X., Olafsson, S., Madsen, L.D. et al. Growth and Characterization of Na0.5K0.5NbO3 Thin Films on Polycrystalline Pt80Ir20 Substrates. Journal of Materials Research 17, 1183–1191 (2002). https://doi.org/10.1557/JMR.2002.0175
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DOI: https://doi.org/10.1557/JMR.2002.0175