Abstract
ZnO has a huge potential and is already a crucial material in a range of key technologies from photovoltaics to opto and printed electronics. ZnO is being characterized by versatile metrologies to reveal electrical, optical, structural and other parameters with the aim of process optimization for best device performance. The aim of the present work is to reveal the capabilities of vacuum ultra-violet (VUV) reflectometry for the characterization of ZnO films of nominally 50 nm, doped by Ga and In. Optical metrologies have already shown to be able to sensitively measure the gap energy, the exciton strength, the density, the surface nanoroughness and a range of technologically important structural and material parameters. It has also been shown that these optical properties closely correlate with the most important electrical properties like the carrier density and hence the specific resistance of the film. We show that VUV reflectometry is a highly sensitive optical method that is capable of the characterization of crucial film properties. Our results have been cross-checked by reference methods such as ellipsometry and X-ray fluorescence.
Similar content being viewed by others
References
U. Özgür, Y. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Dogan, V. Avrutin, S.-J. Cho, H. Morkoc, J. Appl. Phys. 98 (2005) 041301.
P. F. Carcia, R. S. McLean, M. H. Reilly, J. G. Nunes, Appl. Phys. Lett. 82 (2003) 1117.
P. F. Carcia, R. S. McLean, M. H. Reilly, Appl. Phys. Lett. 88 (2006) 123509.
V. Craciun, J. Elders, J. G. E. Gardeniers, I. W. Boyd, Appl. Phys.Lett. 65 (1994) 2963.
V. Craciun, S. Amirhaghi, D. Craciun, J. Elders, J. G. E. Gardeniers, I. W. Boyd, Appl. Phys. Lett. 65 (1994) 2963.
G. Socol, M. Socol, N. Stefan, E. Axente, G. Popescu-Pelin, D. C. L. Duta, C. N. Mihailescu, I. N. Mihailescu, A. Stanculescu, D. Visan, V. Sava, A. C. Galca, C. R. Luculescu, V. Craciun, J. Appl. Phys. 95 (2004) 4953.
M. Baum, S. Polster, M. Jank, I. Alexeev, L. F. M. Schmidt, Appl.Phys. A 107 (2012) 269.
S. A. Studenikin, N. Golego, M. Cocivera, J. Appl. Phys. 84 (1998) 2287.
P. Petrik, B. Pollakowski, S. Zakel, T. Gumprecht, B. Beckhoff, M. Lemberger, Z. Labadi, Zs. Baji, M. Jank, A. Nutsch, “Characterization of ZnO structures by optical and X-ray methods“, accepted for publication in the Applied Surface Science.
T. Gumprecht, G. Roeder, P. Petrik, M. Schellenberger, L. Pfitzner, “Vacuum ultra-violet light induced surface cleaning and layer modification effects of thin dielectric films during reflectometric measurements”, submitted for publication in the Applied Surface Science.
E. (Liz) Stein, D. Allred, Thin Solid Films 517 (2008) 1011–1015.
T. Gumprecht, G. Roeder, M. Schellenberger, L. Pfitzner, “Measurement strategy for dielectric ultra-thin film characterization by vacuum ultra-violet reflectometry”, ASMC Conf. Proc. 2012.
C. Major, A. Nemeth, G. Radnoczi, Z. Czigany, M. Fried, Z. Labadi, I. Barsony, Appl. Surf. Sci. 255 (2009) 8907.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Gumprecht, T., Petrik, P., Roeder, G. et al. Characterization of Thin ZnO Films by Vacuum Ultra-Violet Reflectometry. MRS Online Proceedings Library 1494, 65–70 (2012). https://doi.org/10.1557/opl.2012.1677
Published:
Issue Date:
DOI: https://doi.org/10.1557/opl.2012.1677