Abstract
A new generation of substrate materials with low dielectric permittivity have been developed. These new ceramic-based nanocomposites consist of a quasi two-dimensional, multilayered structure realized by the intercalation of molecular species into the galleries of a host lattice. The materials have been characterized by x-ray diffraction, electronic and infrared spectroscopy. The relative permittivities vary between 2.5 and 4 at 1 MHz. The new hybrids can be processed at relatively low temperatures (below 350°C) and allow for step coverage of submicron structures.
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Mehrotra, V., Kwon, T. & Giannelis, E.P. New Multilayered Materials with Low Dielectric Permittivity for VLSI Applications. MRS Online Proceedings Library 167, 181–186 (1989). https://doi.org/10.1557/PROC-167-181
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DOI: https://doi.org/10.1557/PROC-167-181