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Applications of the Xia Scanning Photoemission Spectromicroscope for Element Identification on Material Surfaces

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Abstract

The Second Generation Scanning Photoemission Microscope at the beamline X1A of the National Synchrotron Light Source (NSLS), X1A SPEM II, is designed for spatially resolved elemental and chemical analysis by X-ray Photoelectron Spectroscopy (XPS) on material surfaces. Based on Fresnel Zone Plate (ZP) microfocusing techniques with the use of a bright and coherent photon source, this microscope is capable of acquiring XPS spectra from a small area irradiated by the focused beam and taking element-specific (using photopeaks) or chemical-state-specific (by detecting the chemical core level shifts) images with a spatial resolution defined by the focused spot size.

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References

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Authors and Affiliations

  1. Department of Physics, SUNY@Stony Brook, Stony Brook, NY, 11794, USA

    Cheng-Hao Ko & Janos Kirz

  2. Department of Physics, NCSU, Raleigh, NC, 27695, USA

    Harald Ade

  3. National Synchrotron Light Source, Brookhaven National Laboratory, Upton, NY, 11973, USA

    Steve Hulbert & Erik Johnson

  4. Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA, 94720, USA

    Erik Anderson

Authors
  1. Cheng-Hao Ko
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  2. Janos Kirz
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  3. Harald Ade
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  4. Steve Hulbert
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  5. Erik Johnson
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  6. Erik Anderson
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Ko, CH., Kirz, J., Ade, H. et al. Applications of the Xia Scanning Photoemission Spectromicroscope for Element Identification on Material Surfaces. MRS Online Proceedings Library 375, 303–305 (1994). https://doi.org/10.1557/PROC-375-303

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  • DOI: https://doi.org/10.1557/PROC-375-303

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