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Electric Field Profile in Jic-Si:H P-I-N Devices

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Abstract

Solar cells based on microcrystalline silicon (μc-Si:H) have demonstrated remarkable efficiencies and have been successfully incorporated in tandem structures; however, little work has so far been devoted to the understanding of these devices. The objective of this paper is to obtain more insight into their physical functioning by extensive characterisation of fuc-Si:H devices. Charge-collection experiments shows that high electric field E(x) is present throughout the entire i-layer of thick p-i-n device. Furthermore, from capacitance studies, one concludes that the electric field profile is partly concentrated at grain boundaries. In contrast with these two observations, spectral response under forward bias voltage show that thick μc-Si:H p-i-n devices are (unlike a-Si:H p-i-n devices) not fully field-controlled.

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Acknowledgement

This work was supported by the Swiss Federal Renewable Energy Program (grant 19431) and the Swiss National Foundation grant FN-45696 and FN-52337.

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Wyrsch, N., Beck, N., Meier, J. et al. Electric Field Profile in Jic-Si:H P-I-N Devices. MRS Online Proceedings Library 507, 181–186 (1998). https://doi.org/10.1557/PROC-507-181

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  • DOI: https://doi.org/10.1557/PROC-507-181

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