Skip to main content
Log in

A Self-Similar Solution for the Growth Rate of a Compound Layer in Thin-Film Binary Diffusion Couples

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

The diffusion controlled growth of a compound phase AnB between two thin films of material A and B is studied with the nonlinear Kirkendall effect included. Previous models of the growth rate do not solve the diffusion equation, and thus do not fully utilize the predictive capability. This paper describes a self-similar transformation that reduces the nonlinear, time-dependent diffusion equation with two free boundaries into a nonlinear ordinary differential equation, which is solved numerically by a shooting method. It is found that the intrinsic diffusion coefficients of A and B in AnB can be determined from the positions of the interfaces without using the concentration profile. This provides a simpler method for measuring intrinsic diffusion coefficients.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Mayer, J. W. and Lau, S. S. Electronic Materials Science: for integrated circuits in Si and GaAs, Macmillan, New York (1990).

    Google Scholar 

  2. Tu, K. N. Mayer, J. W. and Feldman, L. C. Electronic Thin Film Science, Macmillan, New York (1992).

    Google Scholar 

  3. Greer, A. L. Applied Surface Sci. 86, 329 (1995).

    Article  CAS  Google Scholar 

  4. Greer, A. L. Materials Sci. Engineering A134, 1268 (1991).

    Article  CAS  Google Scholar 

  5. Wohlert, S. and Bormann, R. J. Applied Phys. 85, 825 (1999).

    Article  CAS  Google Scholar 

  6. Michaelsen, C. Yan, Z. H. and Bormann, R. J. Appl. Phys. 73, 2249 (1993).

    Article  CAS  Google Scholar 

  7. Lin, J. H. and Chen, L. J. J. Appl. Phys. 77, 4425 (1995).

    Article  CAS  Google Scholar 

  8. Shim, J. Y. Kwak, J. S. and Baik, H. K. Thin Solid Films 288, 309 (1996).

    Article  CAS  Google Scholar 

  9. Munir, Z. A. High Temperature Sci. 27, 279 (1990).

    Google Scholar 

  10. Munir, Z. A. Metallurgical Transactions A 23A, 7 (1992).

    Article  CAS  Google Scholar 

  11. Kidson, G. V. J Nuclear Materials 3, 21 (1961).

    Article  CAS  Google Scholar 

  12. Wagner, C. Acta Metallurgica 17, 99 (1969).

    Article  CAS  Google Scholar 

  13. Shatynski, S. R. Hirth, J. P. and Rapp, R. A. Acta Metallurgica 24, 1071 (1976).

    Article  CAS  Google Scholar 

  14. Williams, D. S. Rapp, R. A. and Hirth, J. P. Metallurgical Transactions A 12A, 639 (1981).

    Article  Google Scholar 

  15. Shewmon, P. G. Diffusion in Solids, McGraw-Hill, New York (1963).

    Google Scholar 

  16. H. Zhang, Master thesis, Louisiana State University (2000).

  17. H. Zhang, and H. Wong, Acta Materialia (in press).

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Huifang Zhang.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Zhang, H., Wong, H. A Self-Similar Solution for the Growth Rate of a Compound Layer in Thin-Film Binary Diffusion Couples. MRS Online Proceedings Library 580, 309–314 (1999). https://doi.org/10.1557/PROC-580-309

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/PROC-580-309

Navigation