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Atomistic Modeling of Ultrathin Fe Films on Cu (111)

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Abstract

We have used the embedded-atom method (EAM) to perform molecular-dynamics (MD) simulations of iron films grown on Cu (111). The iron atoms were randomly deposited, one at a time, above the surface just within the force range of the nearest surface atom. The growth mode is discussed by following the iron film coverage for an incident-atom energy ranged from 0.5eV to 15eV. A transition from island to layer by layer growth is observed as a function of incident energy. The effect of deposition rate is also studied.

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Authors and Affiliations

  1. Department of Physics, Florida Atlantic University, Boca Raton, Florida, 33431, USA

    A. Rakotomahevitra & L. T. Wille

  2. Département de Physique, Université d’Antananarivo, Faculté des Sciences, BP 906, Antananarivo 101, Madagascar, USA

    M. S. Rakotomalala

Authors
  1. A. Rakotomahevitra
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  2. L. T. Wille
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  3. M. S. Rakotomalala
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Rakotomahevitra, A., Wille, L.T. & Rakotomalala, M.S. Atomistic Modeling of Ultrathin Fe Films on Cu (111). MRS Online Proceedings Library 616, 183–188 (2000). https://doi.org/10.1557/PROC-616-183

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