Abstract
The dielectric constants and dielectric losses of ZrTiO4 thin films deposited by DC magnetron reactive sputtering were investigated. The paraelectric properties were measured in the 100kHz range and compared with an equivalent circuit model. As the deposition temperature increased (up to 600°C), the dielectric losses (tanσ) decreased (down to 0.017±0.007), while the dielectric constants (ε) were in the range of 35±7. Post annealing at 800°C in oxygen for 2h reduced tanσ down to 0.005±0.001, higher than those of well-sintered bulk ZrTiO4.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
Rererences
R. J. Cava, W. F. Pcck, Jr., J. J. Krajewski, G. L. Roberts, B. P. Barber, H. M. O’Bryan and P. L. Gammel: Appl. Phys. Lett. 70, 1396 (1997)
G. C. Liang, r. S. Withers, B. F. Cole and N. Newman: IEEE Trans. Microwave Theory & Tech. 42, 34 (1994)
D. E. Oates and A.C. Anderson: IEEE Trans. Magn. 28, 867 (1991)
K. H. Young, G. V. Negrete, R. B. Hannond, A. Inam, R. Ramesh, D. L. Hart and Y. Yonezawa: Appl. Phys. Lett. 58, 1789 (1991)
A. E. McHall and R. S. Roth: J. Am. Ceram. Soc. 66, C18 (1983)
G. Wolfram and E. Gobel: Mater. Res. Bull. 16, 1455 (1981)
E. Newnham: J. Am. Ceram. Soc. 50, 216 (1967)
R. Chriofferson and P. K. Davis: J. Am ceram. Soc. 75, 563 (1992)
C. L. Wang, H. Y. Lee and F. Azough: J. Mater. Sci. 28, 2273 (1993)
D. A. Chang, P. Lin and T.-Y. Tweung: J. Appl. Phys. 77, 4445 (1995)
D. A. Chang, P. Lin and T.-Y. Tweung: J. Appl. Phys. 78, 7103 (1995)
F. J. Wu and T.-Y. Tseung: J. Am. Ceram. Soc. 81, 439 (1998)
O. Nakagawara, Y. Toyota, M. Kobayshi, Y. Yoshino and Y. Katayama: J. Appl. Phys. 80, 388 (1996)
F. Azough, R. Freer, C.-L. Wang and G. W. Lorimer: J. Mater. Sci. 31, 2539 (1996)
Y. Liang and D. Bonnell: J. Am. Ceram. Soc. 78, 2633 (1995)
M. Sayer, A. Manisingh, A. K. Arora and A. Lo: Integrat. Ferroelectr. 1, 129 (1992)
P. C. Joshi and S. B. Desu: J. Appl. Phys. 80, 2349, (1996)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Kim, K., Heo, J., Kim, T. et al. Dielectric Properties Analysis in Paraelectric ZrTiO4 Thin Films. MRS Online Proceedings Library 666, 37 (2000). https://doi.org/10.1557/PROC-666-F3.7
Published:
DOI: https://doi.org/10.1557/PROC-666-F3.7