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dLow Temperature of formation of Nickel Germanide by reaction of Nickel and Crystalline Germanium

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The formation of nickel germanide has been examined over a range of low temperatures (200-400 °C) in an attempt to minimize the thermal budget for the process. Cross-sectional Transmission Electron Microscopy (TEM) was used to determine the texture of the germanide layer and the morphology and constituent composition of the Ge/NiGe interface. The onset and completion of reaction between Ni and Ge were identified by means of a heated stage in combination with in-situ x-ray diffraction (XRD) measurements. The stages of reaction were also monitored using measurements of sheet resistance of the germanides by the Van der Pauw technique. The results have shown that the minimum temperature for the initiation of reaction of Ni and Ge to form NiGe was 225 °C. However, an annealing temperature > 275 °C was necessary for the extensive (and practical) formation of NiGe. Between 200 and 300 °C, the duration of annealing required for the formation of NiGe was significantly longer than at higher temperatures. The stoichiometry of the germanide was very close to NiGe (1:1) as determined using energy dispersive spectroscopy (EDS).

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References

  1. C. Claeys and E. Simoen, Germanium-based Technologies from Materials to Devices (Elsevier, New York, 2007).

  2. B. Yang, J.-Y. Jason Lin, S. Gupta, A.Roy, S. Liang, W. P. Maszara, Y. Nishi and K. Saraswat in Si-Ge Technology and Device Meeting (ISTDM), 88 (2012).

  3. R. R. Leiten et al., Appl. Phys. Lett., 92, 022106 (2008).

    Article  Google Scholar 

  4. S. Gaudet, C. Detavernier, A. J. Kellock, P. Desjardins and C. Lavoie, J Vac Sci Tech A24, 474 (2006).

    Article  CAS  Google Scholar 

  5. F. Nemouchi, D. Mangelinck, C. Bergman, G. Clugnet, P. Gas, J.L Lábár, Appl.Phys.Lett. 89 131920 (2006).

    Article  Google Scholar 

  6. J. Y. Spann, R. A. Anderson, T. J. Thornton, G. Harris, S. G. Thomas and C. Tracy, Elect Device Lett, 26(3), 151 (2005).

    Article  CAS  Google Scholar 

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Algahtani, F., Leech, P.W., Reeves, G.K. et al. dLow Temperature of formation of Nickel Germanide by reaction of Nickel and Crystalline Germanium. MRS Online Proceedings Library 1655, 320 (2014). https://doi.org/10.1557/opl.2014.408

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  • DOI: https://doi.org/10.1557/opl.2014.408

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