Selective Area Morphology Control of Self-Assembled Patterns using Silsesquioxane-containing Block Copolymers

Author information

Suguru Ushiro
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Haruka Mikami
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Mizuki Sato
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Chiharu Hirano
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Yoshinori Suzuki
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Lina Maeda
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Yoshihito Ishida
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Teruaki Hayakawa
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Kohei Aida
Materials Research Laboratory, Hitachi Ltd.
Yasuhiko Tada
Materials Research Laboratory, Hitachi Ltd.
Hiroshi Yoshida
Materials Research Laboratory, Hitachi Ltd.

JOURNAL FREE ACCESS

2012 Volume 25 Issue 1 Pages 83-86

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