Fabrication of Amorphous Carbon Thin Film from CH4 Using PEVCD

Budhi Priyanto; Muh Saleh; Sarayut Tunmee; Chanan Euaruksakul; Yoyok Cahyono; Triwikantoro Triwikantoro; Darminto Darminto

doi:10.4028/www.scientific.net/MSF.966.95

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HomeMaterials Science ForumMaterials Science Forum Vol. 966Fabrication of Amorphous Carbon Thin Film from CH4...

Fabrication of Amorphous Carbon Thin Film from CH₄ Using PEVCD

Abstract:

Thin films of amorphous carbon have successfully been fabricated by radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD). Carbon film fabrication with a methane gas (CH₄) source has been fabricated with deposition parameters: 15 Watt of RF power, 13.5 MHz of frequency, 100 °C of substrate temperature, 450 m Torr of pressure and 120 minutes of deposition time. Methane gas flows were 40, 60, 80 sccm, respectively. Thin film can be in the form of DLC, Graphite or Amorphous Carbon depending on the ratio of hybridized orbitals of sp³, sp² and sp. The X-ray diffractrometry (XRD) show the amorphous phase of the thin film has been formed. Further analysis using Fourier transform infrared (FTIR) combined with synchrotron photoemission spectroscopy (PES) showed that the sp³ hybridization was more dominant than sp². This gives an indication that as fabricated thin films are tetrahedrally amorphous carbon (ta-C). Keywords: Amorphous carbon, methane gas, thin film.

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Periodical:

Materials Science Forum (Volume 966)

Pages:

95-99

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.966.95

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Online since:

August 2019

Authors:

Budhi Priyanto, Muh Saleh, Sarayut Tunmee, Chanan Euaruksakul, Yoyok Cahyono, Triwikantoro Triwikantoro, Darminto Darminto*

Keywords:

Amorphous Carbon, Methane Gas, Thin Film

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