Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Hall Factor in the Quantum Well Structure with Indirect Conduction Minima

간접천이대를 갖는 양자우물 구조에서의 Hall 상수

  • Received : 2013.05.02
  • Accepted : 2013.05.24
  • Published : 2013.06.01
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Abstract

The Hall factor in a quantum well structure with X or L-type indirect conduction valleys is calculated for various strain conditions. The two-dimensional constant energy surfaces of occupied valleys are proven to be identical. As a result, the Hall factor depends on the relative direction of occupied valleys to the growth direction, regardless of the number of occupied valleys. This work is widely applicable to the two-dimensional structure with indirect conduction minima for any growth direction and under different strain conditions.

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References

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