Tribology and Lubricants

Korean Tribology Society (한국트라이볼로지학회)
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Molecular Dynamics Study on the Pattern Transfer in Nanoimprint Lithography

분자 동역학을 이용한 나노임프린트 리소그래피에서의 패턴 전사에 관한 연구

  • Kang Ji-Hoon (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology(KAIST)) ;
  • Kim Kwang-Seop (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology(KAIST)) ;
  • Kim Kyung-Woong (Dept. of Mechanical Engineering, Korea Advanced Institute of Science and Technology(KAIST))
  • 강지훈 (한국과학기술원 기계공학과) ;
  • 김광섭 (한국과학기술원 기계공학과) ;
  • 김경웅 (한국과학기술원 기계공학과)
  • Published : 2005.08.01
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Abstract

The molecular dynamics simulation of nanoimprint lithography (NIL) using $SiO_2$ stamp and amorphous poly-(methylmethacrylate) (PNMA) film is performed to study pattern transfer in NIL. Force fields including bond, angle, torsion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and $SiO_2$ stamp. Nose-Hoover thermostat is used to control the system temperature and cell multipole method is adopted to treat long range interactions. The deformation of PMMA film is observed during pattern transfer in the NIL process. For the detail analysis of deformation characteristics, the distributions of density and stress in PMHA film are calculated. The adhesion and friction forces are obtained by dividing the PMMA film into subregions and calculating the interacting force between subregion and stamp. Their effects on the pattern transfer are also discussed as varying the indentation depth and speed.

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References

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